- All sections
- C - Chemistry; metallurgy
- C23C - Coating metallic material; coating material with metallic material; surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general
- C23C 16/517 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes characterised by the method of coating using electric discharges using a combination of discharges covered by two or more of groups
Patent holdings for IPC class C23C 16/517
Total number of patents in this class: 86
10-year publication summary
|
6
|
3
|
4
|
9
|
9
|
14
|
13
|
8
|
5
|
1
|
| 2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Jiangsu Favored Nanotechnology Co., LTD | 145 |
17 |
| Applied Materials, Inc. | 16587 |
11 |
| Tokyo Electron Limited | 11599 |
8 |
| Lam Research Corporation | 4775 |
8 |
| ASM IP Holding B.V. | 1715 |
3 |
| The Board of Trustees of the University of Illinois | 2623 |
2 |
| Diarotech | 5 |
2 |
| Roth & Rau AG | 31 |
2 |
| The Trustees of Princeton University | 1129 |
2 |
| Universal Display Corporation | 1678 |
2 |
| Samsung Display Co., Ltd. | 30585 |
1 |
| Pratt & Whitney Canada Corp. | 4215 |
1 |
| Micron Technology, Inc. | 24960 |
1 |
| Medtronic, Inc. | 9964 |
1 |
| Shin-Etsu Chemical Co., Ltd. | 5132 |
1 |
| Fraunhofer-Gesellschaft zur Foerderung der angewandten Forschung e.V. | 4569 |
1 |
| BIOTRONIK AG | 387 |
1 |
| Board of Trustees of Michigan State University | 1141 |
1 |
| European Aeronautic Defence and Space Company EADS France | 194 |
1 |
| Evatec AG | 152 |
1 |
| Other owners | 19 |